The elements of the array are identical and their excitation is the same. Ellipticalring magnetic arrays fabricated using zone. Area zone plate fabrication with optical lithography. The zoneplatearraylithography zpal system being commercialized by lumarray, inc. Zoneplatearray lithography using synchrotron radiation. A numerically efficient approach based on the method of moments mom analysis is described for a nonuniform. Photo plate lithography is a very versatile medium. Ellipticalring magnetic arrays fabricated using zoneplatearray lithography. An fet or silicon tft isolates each pixel element and reacts like a switch to sent the electrical charges to the image processor. Multielement lowband vertical arrays approaches for. It employs an array of diffractive optical lenses that focus incident light into onaxis spots.
Note that the merging of, to is a mistake by the model. It took me just a few moments to replicate more or less the first example from that pdf, and the nice thing about it is that, due to its simplicity, its quite easy to generate. Haupt haupt associates state college, pa 16801 abstract a method to design planar phased arrays of. Nanoimprint lithography of 20nmpitch dot array pattern. Pdf lithographic patterning and confocal imaging with. Zoneplatearray lithography in the deep ultraviolet. Theoretically, electron microscopy is compatible with three different types of phase plate. Xray multilevel zone plate fabrication by means of. K9rs moved to pennsylvania in 2005 ray searched for 50 acres but no go. Recently, there is a lot of interest in materials with a refractive index of 1.
Linear array of nonuniformly spaced antennas with non. Zoneplatearray lithography zpal is an opticalmasklesslithography technique, in which an array of tightly focused spots is formed on the surface of a substrate by means of an array of highnumericalaperture zone plates. Zoneplatearray lithography zpal is a maskless lithography scheme that uses an array of shuttered zone plates. However, due to the long write times for electron beam lithography, both the availability and the size of zone plates for condensers have been limited. By using an array of zone plates, and independently controlling their illumination while moving. Analysis model of the 2 2element subarray the slot spacing in the x and y directions are xed to be 4.
Thus, 22 2 11 1,1 1,1 2,1 3,1 1 2 uuuu, 22 2 22 2,2 1,2 2,2 3,2 1 2 uuuu 12 1,2 2,1 1,1 1,2 2,1 2,2 3,1 3,2. Linear array of nonuniformly spaced antennas with nonuniform excitation amplitude ifeoma b. That is, 11 11 is the strain of the material line element aligned with the x1 axis in the undeformed plate, etc. Zone plate fabrication the fzps were patterned using a leica cambridge electronbeam lithography system ebmf 10 cs120, at an accelerating energy of 50 kev and a beam current of 0. The individual beamlets are turned on and off by upstream micromechanics as the substrate is. Maskless, parallel patterning with zoneplate array. Due to the mutual coupling between slots and the endfed in the waveguide, the radiation pattern is asymmetric. Then the fourier transformation period of s and t turns out to be 1 m. We present exposed patterns, describe the system design. This wavelength will allow a large depthoffocus with essentially no proximity effect at a large gap between the zoneplate array and the substrate. Zone plate array lithography zpal is an opticalmaskless lithography technique, in which an array of tightly focused spots is formed on the surface of a substrate by means of an array of highnumericalaperture zone plates.
Compare with array a, the array b can suppress the surface wave and mutual. Us2760432a us160583a us16058350a us2760432a us 2760432 a us2760432 a us 2760432a us 160583 a us160583 a us 160583a us 16058350 a us16058350 a us 16058350a us 2760432 a us2760432 a us 2760432a authority us united states prior art keywords metal portions light surface bared prior art date 19500506 legal status the legal status is an assumption and is not a legal. Department of electrical engineering and computer science. We describe initial steps we have taken in the development of zoneplatearray lithography zpal, a proposed new paradigm for sub100 nm lithography. Multielement lowband vertical arrays approaches for small and other lots dayton hamvention antenna forum may 16, 2008 ray sokola k9rs ted rappaport n9nb. Since the resolution provided by the linear monochromator scales almost. We present a simulation study which examines the use of zone plates for lithography. Zoneplatearray lithography for mask making and military. Porter school of mathematics, university of bristol, bristol, bs8 1tw, uk. Manufacturing of arbitrary shaped optical elements by 3d. Haupt1 and yahya rahmatsamii2 1department of electrical engineering and computer science, colorado school of mines, golden, co 80401 usa email. Zone plate array lithography zpal uses an array of zone plates, combined with an array of micromechanical mirrors or shutters, to pattern features on a substrate without a mask.
We present 3d laser lithography of arbitrary shaped microoptical elements. The optimal implementation of zpal would employ an undulator emitting soft x rays of 4. Platelaminated waveguide slot array antennas and its. Rajesh menon, amil patel, david chao, mathias galus and professor henry i. These tools provide a wide array of measurements including. Their quality, functionality and resiliency to intense femtosecond laser radiation is investigated quantitatively and qualitatively. Direct fabrication of a qplate array by scanning wave photopolymerization miho aizawa,1,2 megumi ota,1,2 kyohei hisano,1,3 norihisa akamatsu,1,2 takeo sasaki,4 christopher j. Schematic of the zone plate array lithography zpal system. Differential near field holography for small antenna arrays by brian a. An antenna array consists of m rows and n columns of elements arranged along a rectangular grid in the xoy plane is shown in figure 1. Introduction to zone plate array lithography zpal zone plate array lithography zpal is a directwrite technique using an array of zone plates to transfer patterns onto a substrate. Zoneplatearray lithography zpal uses an array of zone plates, combined with an array of micromechanical mirrors or shutters, to pattern features on a substrate without a mask.
Barrett,1,5 and atsushi shishido1,2, 1laboratory for chemistry and life science, institute of innovative research, tokyo institute of technology, r112, 4259 nagatsuta, midoriku, yokohama 2268503, japan. A photosensitive array, made up of small pixels that contain a photodiode, absorbs the light from the scintillator and generates electrical charges. Direct fabrication of a qplate array by scanning wave. Performance characterization of a broadband vector apodizing phase plate coronagraph gilles p. Progress in geomathematics graeme bonhamcarter qiuming cheng eds. Us2760432a lithographic plate and method of making it. Platelaminated waveguide slot array antennas and its polarization conversion layers j. An experimental ultraviolet zpal system has been constructed and used to simultaneously expose nine different patterns with a 333 array of zone plates in a quasidotmatrix fashion.
You can create a hand drawn positive on mylar or you can create a digital image and output to a transparency. Pdf ellipticalring magnetic arrays fabricated using. The dot pattern was transferred to a hole pattern on the imprint resist layer by a uvnil process. A perspective on the past, present and future randy l. An array of zone plates focuses radiation beamlets onto a substrate. Uniform and concentric circular antenna arrays synthesis for smart antenna systems using arti. Uniform and concentric circular antenna arrays synthesis. Maskless parallel patterning with zone plate array. The nanoimprint lithography nil of a hexagonal dot array pattern with 20 nm pitch was demonstrated using a tone reversal process. Ways to increase throughput while maintaining surface quality are proposed. Whereas, a unidirectional array has a lobe in one direction and a null in the opposite direction.
Zone plate array lithography zpal is a maskless lithography scheme that employs an array of shuttered zone plates to expose patterns of arbitrary geometry on a resistcoated substrate 14. Box 95, 2300 ra leiden, the netherlands 2department of electrical and computer engineering, north carolina state university. However, designing functional phase plates has been an arduous process that has suffered from unavoidable technical obstacles such as phaseplate charging and difficulties associated with microfabrication of electrostatic and magnetic phase plates. The design of wide band planar arrays of spiral antennas. The basic language is really simple for these kinds of graphs.
Next to the masters and flex stamps, the imprint resists must be compatible with the large area processing. Therefor e, the metal fences can also be used between slots to reduce the mutual coupling. Us4186006a method for developing a lithographic printing. The aluminum plates are coated with a photo sensitive surface. The resist used was pmma 7% 900 k molecular weight whose. A method for developing a lightsensitive lithographic printing plate having an imageforming layer containing a substantially waterinsoluble diazo resin thereon using a developer composition which comprises a benzyl alcohol. This novel method of lithography combines the economic advantages of a maskless scheme and the high throughput of a massively parallel system as well. Zoneplatearray lithography zpal represents a totally new approach to maskless lithography, which has produced extensive experimental results over a very short time.
We construct the following 3d geometrical coordinate system to facilitate the calculation of dm,n. Array plate multiwell microarray hybridization stations by arrayit in 1, 2 and 4 plate capacity models for rapid simultaneous reactions of 96, 192 or 384 peptide, carbohydrate, dna and protein microarrays. Multielement uniform linear arrays when more than two elements are used in an array, the principle of calculating the pattern from which in turn the beamwidth and directive gain can be computed is the same as for a twoelement array. Zoneplate array lithography zpal is a maskless lithography scheme that uses an array of shuttered zone plates to print arbitrary patterns on a substrate. The dot array was formed by the selfassembled polystyrenepolydimethylsiloxane pspdms diblock copolymer. Trained models representation of nested entities, after thresholding the merge values, m see section 2. Second, consider a 2element array whose elements are identical and the same as the array. Maskless, zoneplatearray lithography zpal should be capable of producing 25 nm feature sizes at a throughput of 1 cm 2 second using 4. Array plate multiwell microarray hybridization stations. A film positive is used to expose the image on to the plate with a light exposure unit.
Pattern synthesis for large planar antenna arrays using a. In figure 2 the expansion of 3 types of flex stamps are depicted. Zone platearray lithography using synchrotron radiation a. Arrays of elliptical rings with long axis of 3 mum, short axis of 1.
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